Low-Cost Lithography Hotspot Detection with Active Entropy Sampling and Model Calibration
TimeWednesday, December 8th3:50pm - 4:10pm PST
Event Type
Research Manuscript
Virtual Programs
Presented In-Person
Manufacturing Test and Reliability
DescriptionWith feature size scaling and complexity increase of circuit designs, hotspot detection has become a significant challenge in the very-large-scale-integration (VLSI) industry. In this paper, embedded in pattern sampling and hotspot detection framework, an entropy-based batch mode sampling strategy is proposed in terms of calibrated model uncertainty and data diversity to handle the hotspot detection problem. Redundant patterns can be effectively avoided, and the classifier can converge with high celerity. Experiment results show that our method outperforms previous works in both ICCAD2012 and ICCAD2016 Contest benchmarks, achieving satisfactory detection accuracy and significantly reduced lithography simulation overhead.