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Research Manuscript: Deep Learn your Yield
Event TypeResearch Manuscript
Virtual Programs
Presented In-Person
Keywords
Physical Design and Verification, Lithography and DFM
Topics
EDA
TimeTuesday, December 7th11:30am - 12:00pm PST
Location3016
DescriptionWondering how to improve your manufacturability and yield at sub-5nm? These four papers bring the best of deep learning technologies and creative approaches to transfer learn layout pattern generations, attack data imbalance, insert SRAFs and accelerate dummy fill computation.