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DTSTAMP:20211208T164412Z
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DTSTART;TZID=America/Los_Angeles:20211208T161000
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UID:dac_DAC 2021_sess134_RESEARCH1036@linklings.com
SUMMARY:A New, Computationally Efficient “Blech Criterion” for Immortality
  in General Interconnects
DESCRIPTION:Research Manuscript\n\nA New, Computationally Efficient “Blech
  Criterion” for Immortality in General Interconnects\n\nShohel\n\nElectrom
 igration (EM) has become a key reliability issue in current VLSI technolog
 y. Methodologies for analyzing EM first filter immortal wires using Blech'
 s criterion, and then perform detailed EM analysis on the remaining wires.
   However, the traditional Blech's criterion was designed for two-terminal
  wires and does not extend to general structures. This paper demonstrates 
 a first-principles-based solution technique for determining the steady-sta
 te stress at all the nodes of a general interconnect tree, and develops an
  immortality test whose complexity is linear in the number of nodes in the
  tree.  The proposed model is applied to a variety of interconnect structu
 res.\n\nTopic: EDA\n\nKeyword: Manufacturing Test and Reliability\n\nVirtu
 al Program: Presented In-Person
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