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DTSTAMP:20211208T164412Z
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DTSTART;TZID=America/Los_Angeles:20211208T155000
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UID:dac_DAC 2021_sess134_RESEARCH515@linklings.com
SUMMARY:Low-Cost Lithography Hotspot Detection with Active Entropy Samplin
 g and Model Calibration
DESCRIPTION:Research Manuscript\n\nLow-Cost Lithography Hotspot Detection 
 with Active Entropy Sampling and Model Calibration\n\nXiao\n\nWith feature
  size scaling and complexity increase of circuit designs, hotspot detectio
 n has become a significant challenge in the very-large-scale-integration (
 VLSI) industry.  In this paper, embedded in pattern sampling and hotspot d
 etection framework, an entropy-based batch mode sampling strategy is propo
 sed in terms of calibrated model uncertainty and data diversity to handle 
 the hotspot detection problem. Redundant patterns can be effectively avoid
 ed, and the classifier can converge with high celerity. Experiment results
  show that our method outperforms previous works in both ICCAD2012 and ICC
 AD2016 Contest benchmarks, achieving satisfactory detection accuracy and s
 ignificantly reduced lithography simulation overhead.\n\nTopic: EDA\n\nKey
 word: Manufacturing Test and Reliability\n\nVirtual Program: Presented In-
 Person
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