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DTSTART:19700308T020000
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DTSTAMP:20211208T164413Z
LOCATION:3020
DTSTART;TZID=America/Los_Angeles:20211209T103000
DTEND;TZID=America/Los_Angeles:20211209T110000
UID:dac_DAC 2021_sess168_RESSP123@linklings.com
SUMMARY:Mask Synthesis in the Era of GPU Computing and Deep Learning
DESCRIPTION:Special Session (Research Track)\n\nMask Synthesis in the Era 
 of GPU Computing and Deep Learning\n\nKhailany, Pan, Peng\n\nIn semiconduc
 tor high-volume manufacturing (HVM), lithography and etch modeling of the 
 patterning process from photomask to silicon plays a fundamental role. In 
 the past few years, Deep Learning (DL) has been successfully applied to ca
 pture the residue error of traditional optical and etch models, with great
 ly improved results. This talk will highlight recent progress using DL for
  process modeling.  Inverse Lithography Technology (ILT), a scientifically
  rigorous and satisfying approach, was originally proposed, advocated, and
  demonstrated in 2003 by Luminescent Technologies, a startup company found
 ed by Dr. Peng.  At the time, wide adoption of ILT was hindered by two iss
 ues in HVM: long computation times and long mask write times using the exi
 sting VSB mask writer. Tools to address both issues rose in the past few y
 ears:  GPUs and Multiple-Beam mask writers. In this talk, Dr. Peng will sh
 are recent work on supporting GPUs in lithography and etch modeling and IL
 T.\n\nTopic: EDA, Machine Learning/AI\n\nVirtual Program: Hosted in Virtua
 l Platform, Presented In-Person
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