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Session

Research Manuscript: Deep Learn Your Yield
Event TypeResearch Manuscript
Virtual Programs
Hosted in Virtual Platform
Keywords
Physical Design and Verification, Lithography and DFM
Topics
EDA
Time
Location
DescriptionWondering how to improve your manufacturability and yield at sub-5nm? These four papers bring the best of deep learning technologies and creative approaches to transfer learn layout pattern generations, attack data imbalance, insert SRAFs and accelerate dummy fill computation.
Presentations
NeurFill: Migrating Full-Chip CMP Simulators to Neural Networks for Model-Based Dummy Filling Synthesis
Authors
Junzhe Cai
Changhao Yan
Yuzhe Ma
Bei Yu
Dian Zhou
Xuan Zeng
Hosted in Virtual Platform
Subresolution Assist Feature Insertion by Variational Adversarial Active Learning and Clustering with Data Point Retrieval
Authors
Shang-En Tseng
Iris Hui-Ru Jiang
James P. Shiely
Hosted in Virtual Platform
Attentional Transfer is All You Need: Technology-aware Layout Pattern Generation
Authors
Xiaopeng Zhang
Haoyu Yang
Evangeline F.Y. Young
Hosted in Virtual Platform